◆  Application:

   Diffusion and oxidation of crystalline silicon solar cell.

 

◆  Equipment Highlights

Application:P-type,N-type,annealing, low pressure diffusion

Wafer loading1000pcs/batch/tube

High efficiency solution with low COO

Up-time>98%

◆   Main Parameters:

NO.

ITEM

DESCRIPTION

1

Quartz tube diameter

ø290~ø320mmfor 125mm 156mm

2

Throughput

≥1000 cells/batch/tube1~5 tubes/machine

3

Temp. range

4001100

4

Temp. control

Precise double-mode control system

5

Length and accuracy

≤±0.5/1300mm(800~1100℃),                      

≤±1/1300mm400~800℃)

6

Temp. stability

≤±0.5/4h.880℃)

7

Temp. change rate

Heating:Max.20/min.Cooling:Max.6/min

8

Purification level

100environment 1000/1000 (environment 10000)

9

Conveyer system

SiC automatic level moving201000mm/min. speed adjustable

10

Gaseous measure

MFC precise control

11

Pressure control

Immediate feedback and adjust pressure level automatically 

12

Technics data control

AutomaticPLC+computeroperate by touch panel 

13

Dimensions

7370×2100×3300L×W×Hmm,5-tube

 

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